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Workshops
Ellipsometric Spectroscopy:
From Fundamentals to Real-World Data Analysis for Thin Films and Sensors
Description
Spectroscopic ellipsometry (SE) is a highly sensitive, non-destructive optical technique that allows the characterization of thin films and structured materials by analyzing the change in polarization of light reflected or transmitted by a sample. From this measurement, parameters such as nanometer thickness, optical constants (n and k), effective roughness, and, in many cases, the composition or porosity of the materials can be determined.
This workshop offers comprehensive training, ranging from the physical foundations of the technique to the analysis of real experimental data, with direct applications in sensors, functional coatings, energy, and the environment. The experience is enhanced by access to the ellipsometer at the Francisco José de Caldas District University, providing a practical and educational approach of high value to the country's scientific and academic community.
General Objective:
By the end of the workshop, participants will be able to:
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Understand the physical principles of ellipsometry and the meaning of the parameters Ψ and Δ.
-
Identify when ellipsometry is the appropriate technique for a materials characterization problem.
-
Construct basic optical models (substrate + layers + roughness).
-
Fit real data and extract parameters such as thickness and optical constants (n, k).
-
Interpret results, evaluate the quality of the fit, and discuss uncertainties.
Instructor: Prof. César Aurelio Herreño-Fierro
Email: caherrenof@udistrital.edu.co
Format: Theoretical-demonstrative-practical workshop
Duration: 4 to 6 hours (distributed over a minimum of 2 days, ideally 3 days)
Language: Spanish (English may be offered depending on the audience)
Hardware cuántico:
del átomo al chip
Description
Este workshop técnico intensivo está diseñado para llevar a los participantes desde la teoría cuántica abstracta hasta la ingeniería real del hardware cuántico que permite construir los computadores cuánticos actuales. El enfoque del curso es comprender cómo se materializa un qubit en sistemas físicos reales y cuáles son los desafíos tecnológicos que enfrenta la computación cuántica moderna.
Coordinator of the Master's Program in Applied Electronic Engineering. University of Guanajuato
This intensive technical workshop is designed to take participants from abstract quantum theory to the actual engineering of quantum hardware that enables the construction of today's quantum computers. The course focuses on understanding how a qubit materializes in real physical systems and what technological challenges modern quantum computing faces.
The workshop connects fundamentals of quantum physics, engineering, materials science, and experimental control, offering a clear and applied view of the main technological platforms used today for the development of quantum hardware.
General Objective: To understand the physical realizations of qubits by analyzing the physical principles, associated engineering, and technological limitations of the main current quantum computing platforms.
Instructor: Herbert Vinck
Format: School of Quantum Physics Format: Intensive technical workshop
Duration: 4 sessions of 3 hours each (12 hours total)
Spread: 2 days
Maximum capacity: 50 participants
Contents
Before choosing a system, we must understand the DiVincenzo Criteria, which dictate what makes a physical system a viable qubit:
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Identification: A well-defined two-level system.
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Scalability: The ability to add more qubits.
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Initialization: The ability to bring the system to a known state (e.g. )
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Coherence: Long lifetimes in the face of ambient noise.
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Universality: A set of quantum logic gates.
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Readability: The ability to efficiently measure the final state.
Technical Comparison of Platforms
Workshop on mathematical models for machine learning and their application in optical sensors
Coordinator of the Master's Program in Applied Electronic Engineering. University of Guanajuato
Description
El desarrollo de sistemas de monitoreo capaces de medir de manera simultánea diferentes magnitudes físicas en diferentes puntos del espacio es importante para tener la caracterización completa de un proceso, así como para optimizar y economizar el proceso de lectura. Las dos principales arquitecturas de sistemas de monitoreo basados en sensores ópticos interferométricos uniparamétricos son de una salida o varias salidas. En la primera arquitectura la salida es un solo espectro de interferencia complejo que contiene la información de todas las variables físicas.
Para poder interpretar correctamente este espectro es necesario aplicar métodos de aprendizaje de máquina como la Regresión de Cresta de Núcleo, con el cual se pueden estimar los valores correspondientes a cada parámetro en un amplio rango de operación. Para la segunda arquitectura, los sensores uniparamétricos son independientes, obteniendo así múltiples espectros simultáneos. Cada espectro trae la información de una variable física y para saber la procedencia de los espectros es necesario aplicar una técnica como el Análisis
de Componente Principales con Núcleos.
Objetivo de aprendizaje
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Aplicar el Análisis de Componente Principales con Núcleo para proyectar datos espacialmente complejos en un plano 2D o 3D donde la información relevante es visible y separable.
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Aplicar el modelo de Regresión Lineal de Cresta de Núcleo para estimar el valor de una variable física objetivo en función de valores de entrada tomadas de las señales de salida de un sensor óptico interferométrico u otro dispositivo bajo estudio.
Ponente: Dra. Ana Dinora Guzmán Chávez, Profesor Titular, Universidad de Guanajuato, México.
Modalidad: Taller con componente teórico + demostrativo + práctico
Duración: 4 a 6 horas, ajustable según número de inscritos y ritmo del grupo. El curso será en español
Distribución obligatoria: en mínimo 2 días, idealmente 3 días (el trabajo práctico requiere trabajo autónomo entre sesiones)
Cupo máximo: 15 participantes.
Description
Spectroscopic ellipsometry (SE) is a highly sensitive, non-destructive optical technique that allows the characterization of thin films and structured materials by analyzing the change in polarization of light reflected or transmitted by a sample. From this measurement, parameters such as nanometer thickness, optical constants (n and k), effective roughness, and, in many cases, the composition or porosity of the materials can be determined.
This workshop offers comprehensive training, ranging from the physical foundations of the technique to the analysis of real experimental data, with direct applications in sensors, functional coatings, energy, and the environment. The experience is enhanced by access to the ellipsometer at the Francisco José de Caldas District University, providing a practical and educational approach of high value to the country's scientific and academic community.
General Objective:
By the end of the workshop, participants will be able to:
-
Understand the physical principles of ellipsometry and the meaning of the parameters Ψ and Δ.
-
Identify when ellipsometry is the appropriate technique for a materials characterization problem.
-
Construct basic optical models (substrate + layers + roughness).
-
Fit real data and extract parameters such as thickness and optical constants (n, k).
-
Interpret results, evaluate the quality of the fit, and discuss uncertainties.